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View into the deposition zone of an atmospheric pressure
ArcJet plasma enhanced CVD reactor
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Atmospheric pressure plasma CVD-techniques (AP-PECVD) are suitable for
large area deposition of high-quality functional layers without an expensive
vacuum plant. Temperature sensitive materials (special steels, light metals,
glasses, polymers) and materials with moderately curved surface and variable
thickness can be continuously coated at high rates. In particular, SiO2
is recommended as barrier or anti-corrosion coating. Silicon nitride or
silica layers can be used as scratch resistant transparent coatings, e.g.
on stainless steel.
CVD Diamond Deposition System
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